CASE STUDY # 85
1. Headline: A new technology reduces waste at a California
semiconductor firm.
2. Background: See below.
3. Cleaner Production Principle: New technology
4. Description of Cleaner Production Application: The company
utilizes automated photoresistant dispensing systems in
its operation. The automated dispensing system is
designed and sold by Tritec Industries in Mountain View,
California. It is reported that the system provides
maximum usage of photoresist from the supply bottles,
continuous uninterrupted operation with minimal operator
assistance, and point of use filtration resulting in
higher wafer yields. The dispense system does not require
any modification or adjustments to the existing dispense
systems on spinner tracks.
Material/Energy Balances and Substitutions:
FEEDSTOCKS:
Photoresist
WASTES: Residual
photoresist
MEDIUM: Supply
bottles
5. Economics:
COST: (1985
dollars)
CAPITAL COST:
$3,750/unit
MONTHS TO RECOVER
INVESTMENT: 7
6. Advantages
FEEDSTOCK REDUCTION:
$6,750/year per unit (based on an
18% annual reduction in
photoresist waste)
WASTE PRODUCTION: 50%
reduction in photoresist waste
IMPACT: Reduces
need for virgin photoresist by
utilizing higher percentage of
photoresist in supply bottles.
Reduces waste photoresist
incineration/landfilling
requirements.
7. Constraints: No information provided.
8. Contacts and Citation:
"Waste Generation and Disposition Practices and Currently
Applied Waste Minimization Techniques within the
Semiconductor Industry," State of California Department of
Health Services Waste Reduction Grant Number 85-00181,
Semiconductor Industry Association, Cupertino, California,
August, 1987, Page 13.
Name and Location of Company:
Semiconductor Industry Association (SIA)
Steven Pedersen
Director
Environmental and OSHA Affairs
SIA
10201 Torre Avenue
Suite 275, Cupertino
CA 95014
United States
9. Keywords: United States, USA; semiconductor, new
technology, ISIC 3674, photoresist
10. Reviewer's Comments: This case study was originally
abstracted for the United States Environmental Protection
Agency's Pollution Prevention Information Clearinghouse.
It underwent a UNEP IE funded technical review in 1994 for
quality and completeness. It was edited for the ICPIC
diskette by UNEP IE in July 1995.
(DOCNO: UNEP01.52 201-001-A-002)